%0 Journal Article %1 journals/mr/TardyEDGTBCBZ07 %A Tardy, Jacques %A Erouel, Mohsen %A Deman, A. L. %A Gagnaire, A. %A Teodorescu, V. %A Blanchin, M. G. %A Canut, B. %A Barau, A. %A Zaharescu, M. %D 2007 %J Microelectron. Reliab. %K dblp %N 2-3 %P 372-377 %T Organic thin film transistors with HfO2 high-k gate dielectric grown by anodic oxidation or deposited by sol-gel. %U http://dblp.uni-trier.de/db/journals/mr/mr47.html#TardyEDGTBCBZ07 %V 47

@article{journals/mr/TardyEDGTBCBZ07, added-at = {2020-02-22T00:00:00.000+0100}, author = {Tardy, Jacques and Erouel, Mohsen and Deman, A. L. and Gagnaire, A. and Teodorescu, V. and Blanchin, M. G. and Canut, B. and Barau, A. and Zaharescu, M.}, biburl = {https://www.bibsonomy.org/bibtex/20706b57f1928dcf7c3759844194bd849/dblp}, ee = {https://doi.org/10.1016/j.microrel.2006.01.012}, interhash = {6c55482d9a94ebcd31750f2f1ed48909}, intrahash = {0706b57f1928dcf7c3759844194bd849}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = {2-3}, pages = {372-377}, timestamp = {2020-02-25T13:25:01.000+0100}, title = {Organic thin film transistors with HfO2 high-k gate dielectric grown by anodic oxidation or deposited by sol-gel.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr47.html#TardyEDGTBCBZ07}, volume = 47, year = 2007 }