Article,
Nanomorph silicon grown on template alumina substrate by plasma-enhanced \CVD\
Materials Letters, 63 (29): 2552 - 2555 (2009)
DOI: http://dx.doi.org/10.1016/j.matlet.2009.09.002
Abstract
Novel morphology of amorphous/nanocrystalline (nanomorph) silicon has been obtained by plasma enhanced \CVD\ using template porous alumina substrate. The growing heterogeneous Si layer is composed of nanocrystalline and amorphous distinct areas, conformal to the tipped/ribbed alumina template. Raman spectroscopy and \XRD\ data evidence the plasma-assisted preferential growth of nanocrystalline Si bunches forming the honeycomb net and presumably amorphous Si:H areas between them.
