%0 Conference Paper %1 conf/3dic/TakaSTM15 %A Taka, Hiroshi %A Suzuki, Katsumasa %A Tsujioka, Norihiro %A Murakami, Shoichi %B 3DIC %D 2015 %I IEEE %K dblp %P TS8.2.1-TS8.2.4 %T Development of high-quality low-temperature (≤ 120°C) PECVD-SiN films by organosilane. %U http://dblp.uni-trier.de/db/conf/3dic/3dic2015.html#TakaSTM15 %@ 978-1-4673-9385-0

@inproceedings{conf/3dic/TakaSTM15, added-at = {2017-05-21T00:00:00.000+0200}, author = {Taka, Hiroshi and Suzuki, Katsumasa and Tsujioka, Norihiro and Murakami, Shoichi}, biburl = {https://www.bibsonomy.org/bibtex/2b989769f3dbc36ae2d0ae499397e050d/dblp}, booktitle = {3DIC}, crossref = {conf/3dic/2015}, ee = {https://doi.org/10.1109/3DIC.2015.7334600}, interhash = {a536464c997498be0f10f135ed2ad446}, intrahash = {b989769f3dbc36ae2d0ae499397e050d}, isbn = {978-1-4673-9385-0}, keywords = {dblp}, pages = {TS8.2.1-TS8.2.4}, publisher = {IEEE}, timestamp = {2019-10-17T15:31:37.000+0200}, title = {Development of high-quality low-temperature (≤ 120°C) PECVD-SiN films by organosilane.}, url = {http://dblp.uni-trier.de/db/conf/3dic/3dic2015.html#TakaSTM15}, year = 2015 }