%0 Journal Article %1 hu2014oxygeninsensitive %A Hu, Xin %A Huang, Shisong %A Gu, Ronghua %A Yuan, Changsheng %A Ge, Haixiong %A Chen, Yanfeng %D 2014 %J Macromolecular Rapid Communications %K 3D molding nextgen thiolene %N 19 %P 1712--1718 %R 10.1002/marc.201400251 %T An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography %U http://dx.doi.org/10.1002/marc.201400251 %V 35 %X In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, com­prising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxa­spiro 4.2.4.2 tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer.

@article{hu2014oxygeninsensitive, abstract = {In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, com­prising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxa­spiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer. }, added-at = {2016-12-01T12:12:05.000+0100}, author = {Hu, Xin and Huang, Shisong and Gu, Ronghua and Yuan, Changsheng and Ge, Haixiong and Chen, Yanfeng}, biburl = {https://www.bibsonomy.org/bibtex/21aefbf4f6da05716980c435fbb98a911/bkoch}, description = {An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography - Hu - 2014 - Macromolecular Rapid Communications - Wiley Online Library}, doi = {10.1002/marc.201400251}, interhash = {c6b69408352ee04e9303df8c04393bf7}, intrahash = {1aefbf4f6da05716980c435fbb98a911}, issn = {1521-3927}, journal = {Macromolecular Rapid Communications}, keywords = {3D molding nextgen thiolene}, number = 19, pages = {1712--1718}, timestamp = {2016-12-01T12:12:05.000+0100}, title = {An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV-Nanoimprint Lithography}, url = {http://dx.doi.org/10.1002/marc.201400251}, volume = 35, year = 2014 }