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%0 Conference Paper
%1 conf/IEEEcca/GhalehbeygiBFH15
%A Ghalehbeygi, Omid T.
%A Berriman, Garth
%A Fleming, Andrew J.
%A Holdsworth, John L.
%B CCA
%D 2015
%I IEEE
%K dblp
%P 1868-1873
%T Optimization and simulation of exposure pattern for scanning laser lithography.
%U http://dblp.uni-trier.de/db/conf/IEEEcca/IEEEcca2015.html#GhalehbeygiBFH15
%@ 978-1-4799-7787-1
@inproceedings{conf/IEEEcca/GhalehbeygiBFH15,
added-at = {2019-09-25T00:00:00.000+0200},
author = {Ghalehbeygi, Omid T. and Berriman, Garth and Fleming, Andrew J. and Holdsworth, John L.},
biburl = {https://www.bibsonomy.org/bibtex/2228ba7b9ba28cbdaca22d76226bac16e/dblp},
booktitle = {CCA},
crossref = {conf/IEEEcca/2015},
ee = {https://doi.org/10.1109/CCA.2015.7320882},
interhash = {d0c6922b07f85371d1d205d813e18923},
intrahash = {228ba7b9ba28cbdaca22d76226bac16e},
isbn = {978-1-4799-7787-1},
keywords = {dblp},
pages = {1868-1873},
publisher = {IEEE},
timestamp = {2019-10-17T12:47:22.000+0200},
title = {Optimization and simulation of exposure pattern for scanning laser lithography.},
url = {http://dblp.uni-trier.de/db/conf/IEEEcca/IEEEcca2015.html#GhalehbeygiBFH15},
year = 2015
}