%0 Journal Article %1 journals/ieicet/KatoEINYI10 %A Kato, Kokoro %A Endo, Masakazu %A Inoue, Tadao %A Nakatake, Shigetoshi %A Yamabe, Masaki %A Ishihara, Sunao %D 2010 %J IEICE Trans. Fundam. Electron. Commun. Comput. Sci. %K dblp %N 12 %P 2424-2432 %T Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing. %U http://dblp.uni-trier.de/db/journals/ieicet/ieicet93a.html#KatoEINYI10 %V 93-A

@article{journals/ieicet/KatoEINYI10, added-at = {2020-04-11T00:00:00.000+0200}, author = {Kato, Kokoro and Endo, Masakazu and Inoue, Tadao and Nakatake, Shigetoshi and Yamabe, Masaki and Ishihara, Sunao}, biburl = {https://www.bibsonomy.org/bibtex/29d5df48ee9f8f03270f2bc269b324a58/dblp}, ee = {http://search.ieice.org/bin/summary.php?id=e93-a_12_2424}, interhash = {d3ba331cab4e55e881b0dd9e05627440}, intrahash = {9d5df48ee9f8f03270f2bc269b324a58}, journal = {IEICE Trans. Fundam. Electron. Commun. Comput. Sci.}, keywords = {dblp}, number = 12, pages = {2424-2432}, timestamp = {2020-04-14T12:02:23.000+0200}, title = {Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing.}, url = {http://dblp.uni-trier.de/db/journals/ieicet/ieicet93a.html#KatoEINYI10}, volume = {93-A}, year = 2010 }