%0 Conference Paper %1 conf/vlsit/OkaIIAKM22 %A Oka, Hiroshi %A Inaba, Takumi %A Iizuka, Shota %A Asai, Hidehiro %A Kato, Kimihiko %A Mori, Takahiro %B VLSI Technology and Circuits %D 2022 %I IEEE %K dblp %P 334-335 %T Effect of Conduction Band Edge States on Coulomb-Limiting Electron Mobility in Cryogenic MOSFET Operation. %U http://dblp.uni-trier.de/db/conf/vlsit/vlsit2022.html#OkaIIAKM22 %@ 978-1-6654-9772-5

@inproceedings{conf/vlsit/OkaIIAKM22, added-at = {2023-06-26T00:00:00.000+0200}, author = {Oka, Hiroshi and Inaba, Takumi and Iizuka, Shota and Asai, Hidehiro and Kato, Kimihiko and Mori, Takahiro}, biburl = {https://www.bibsonomy.org/bibtex/246e591b02b9a7f3b60e250656f4b7fbc/dblp}, booktitle = {VLSI Technology and Circuits}, crossref = {conf/vlsit/2022}, ee = {https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830505}, interhash = {dd57e9c6cd7d8680fe1e1bb223f297cf}, intrahash = {46e591b02b9a7f3b60e250656f4b7fbc}, isbn = {978-1-6654-9772-5}, keywords = {dblp}, pages = {334-335}, publisher = {IEEE}, timestamp = {2024-04-09T19:13:06.000+0200}, title = {Effect of Conduction Band Edge States on Coulomb-Limiting Electron Mobility in Cryogenic MOSFET Operation.}, url = {http://dblp.uni-trier.de/db/conf/vlsit/vlsit2022.html#OkaIIAKM22}, year = 2022 }