Please log in to take part in the discussion (add own reviews or comments).
Cite this publication
More citation styles
- please select -
%0 Journal Article
%1 journals/mr/PotterMSARG14
%A Potter, Kenneth
%A Morgan, Katrina A.
%A Shaw, Chris
%A Ashburn, Peter
%A Redman-White, William
%A Groot, C. H. De
%D 2014
%J Microelectron. Reliab.
%K dblp
%N 9-10
%P 2339-2343
%T Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide.
%U http://dblp.uni-trier.de/db/journals/mr/mr54.html#PotterMSARG14
%V 54
@article{journals/mr/PotterMSARG14,
added-at = {2020-02-22T00:00:00.000+0100},
author = {Potter, Kenneth and Morgan, Katrina A. and Shaw, Chris and Ashburn, Peter and Redman-White, William and Groot, C. H. De},
biburl = {https://www.bibsonomy.org/bibtex/2128781f5c7a019bcbaf39f6bfa577bee/dblp},
ee = {https://doi.org/10.1016/j.microrel.2014.07.018},
interhash = {f823848f0939c1122c84460dd584243b},
intrahash = {128781f5c7a019bcbaf39f6bfa577bee},
journal = {Microelectron. Reliab.},
keywords = {dblp},
number = {9-10},
pages = {2339-2343},
timestamp = {2020-02-25T13:29:10.000+0100},
title = {Total ionizing dose response of fluorine implanted Silicon-On-Insulator buried oxide.},
url = {http://dblp.uni-trier.de/db/journals/mr/mr54.html#PotterMSARG14},
volume = 54,
year = 2014
}