%0 Journal Article %1 journals/mr/LombardoSL02 %A Lombardo, Salvatore %A Stathis, James H. %A Linder, Barry P. %D 2002 %J Microelectron. Reliab. %K dblp %N 9-11 %P 1481-1484 %T Dependence of Post-Breakdown Conduction on Gate Oxide Thickness. %U http://dblp.uni-trier.de/db/journals/mr/mr42.html#LombardoSL02 %V 42

@article{journals/mr/LombardoSL02, added-at = {2020-02-22T00:00:00.000+0100}, author = {Lombardo, Salvatore and Stathis, James H. and Linder, Barry P.}, biburl = {https://www.bibsonomy.org/bibtex/2bcf78617627791cc65dc3ebb20cec6c4/dblp}, ee = {https://doi.org/10.1016/S0026-2714(02)00174-9}, interhash = {182041f7a99eae20cdbc4e1eeb53fcbd}, intrahash = {bcf78617627791cc65dc3ebb20cec6c4}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = {9-11}, pages = {1481-1484}, timestamp = {2020-02-25T13:29:31.000+0100}, title = {Dependence of Post-Breakdown Conduction on Gate Oxide Thickness.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr42.html#LombardoSL02}, volume = 42, year = 2002 }