Continuous MOSFET performance increase with device scaling: The role of strain and channel material innovations.
, , , , , and .
IBM Journal of Research and Development 50 (4-5): 363-376 (2006)

  • @dblp
This publication has not been reviewed yet.

rating distribution
average user rating0.0 out of 5.0 based on 0 reviews
    Please log in to take part in the discussion (add own reviews or comments).