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GAN-OPC: mask optimization with lithography-guided generative adversarial nets.

, , , , and . DAC, page 131:1-131:6. ACM, (2018)

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VLSI layout hotspot detection based on discriminative feature extraction., , , and . APCCAS, page 542-545. IEEE, (2016)Voltage-island driven floorplanning considering level-shifter positions., , , and . ACM Great Lakes Symposium on VLSI, page 51-56. ACM, (2009)GAN-OPC: mask optimization with lithography-guided generative adversarial nets., , , , and . DAC, page 131:1-131:6. ACM, (2018)Self-aligned double patterning layout decomposition with complementary e-beam lithography., , and . ASP-DAC, page 143-148. IEEE, (2014)Machine learning and pattern matching in physical design., , , and . ASP-DAC, page 286-293. IEEE, (2015)A high-performance triple patterning layout decomposer with balanced density., , , , , and . ICCAD, page 163-169. IEEE, (2013)HClaimE: A tool for identifying health claims in health news headlines., and . Inf. Process. Manag., 56 (4): 1220-1233 (2019)Tensor Low-Rank Reconstruction for Semantic Segmentation., , , , , , and . ECCV (17), volume 12362 of Lecture Notes in Computer Science, page 52-69. Springer, (2020)Deep Learning-Driven Simultaneous Layout Decomposition and Mask Optimization., , , , , and . DAC, page 1-6. IEEE, (2020)Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography., , , , , , and . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 34 (5): 726-739 (2015)