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Disambiguation of "Hong, Sang Jeen"

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Neural-Network-Based Sensor Fusion of Optical Emission and Mass Spectroscopy Data for Real-Time Fault Detection in Reactive Ion Etching.

, and . IEEE Trans. Ind. Electron., 52 (4): 1063-1072 (2005)

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Sang-Chul Hong

Hong-Sang Kim

Johannes Jeenel

Chawalit Jeenanunta

Ulrich Jeenel

 

Other publications of authors with the same name

Modeling and Characterization of Plasma Processes Using Modular Neural Network., , and . ISNN (2), volume 3973 of Lecture Notes in Computer Science, page 1014-1019. Springer, (2006)A comparison and analysis of genetic algorithm and particle swarm optimization using neural network models for high efficiency solar cell fabrication processes., , and . FUZZ-IEEE, page 1879-1884. IEEE, (2009)Characterization of Negative Photoresist Processing by Statistical Design of Experiment (DOE)., , , and . J. Inform. and Commun. Convergence Engineering, 3 (4): 191-194 (2005)Fault Detection in the Semiconductor Etch Process Using the Seasonal Autoregressive Integrated Moving Average Modeling., , and . J. Inf. Process. Syst., 10 (3): 429-442 (2014)Generative Adversarial Network-Based Fault Detection in Semiconductor Equipment with Class-Imbalanced Data., , , and . Sensors, 23 (4): 1889 (February 2023)Time Series Fault Prediction in Semiconductor Equipment Using Recurrent Neural Network., , and . ISNN (2), volume 7952 of Lecture Notes in Computer Science, page 463-472. Springer, (2013)Sensitivity Analysis of Plasma Charge-up Monitoring Sensor., , and . J. Inform. and Commun. Convergence Engineering, 3 (4): 187-190 (2005)Endpoint Detection of SiO2 Plasma Etching Using Expanded Hidden Markov Model., , , and . ISNN (2), volume 6064 of Lecture Notes in Computer Science, page 464-471. Springer, (2010)Recognition of Plasma-Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network., , and . ISNN (2), volume 3973 of Lecture Notes in Computer Science, page 1036-1042. Springer, (2006)Neural-Network-Based Sensor Fusion of Optical Emission and Mass Spectroscopy Data for Real-Time Fault Detection in Reactive Ion Etching., and . IEEE Trans. Ind. Electron., 52 (4): 1063-1072 (2005)