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Variation behavior of tunnel-FETs originated from dopant concentration at source region and channel edge configuration.

, , , , , , , , , , and . ESSDERC, page 278-281. IEEE, (2014)

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Work-function variation induced fluctuation in bias-temperature-instability characteristics of emerging metal-gate devices and implications for digital design., , and . ICCAD, page 714-720. IEEE, (2010)Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on tunnel FET performance., , , , , , , , , and 1 other author(s). ESSDERC, page 182-185. IEEE, (2014)Advanced FinFET technologies for boosting SRAM performance.. ASICON, page 1141-1144. IEEE, (2017)PBTI for N-type tunnel FinFETs., , , , , , , , , and 4 other author(s). ICICDT, page 1-4. IEEE, (2015)Correction to Änalytical Thermal Model for Self-Heating in Advanced FinFET Devices With Implications for Design and Reliability"., , , and . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 39 (1): 277 (2020)FinFET-Based Flex-Vth SRAM Design for Drastic Standby-Leakage-Current Reduction., , , , , , , , and . IEICE Trans. Electron., 91-C (4): 534-542 (2008)0.5V FinFET SRAM with dynamic threshold control of pass gates for salvaging malfunctioned bits., , , , , , , , , and 2 other author(s). ESSCIRC, page 474-477. IEEE, (2010)Performance limit of parallel electric field tunnel FET and improvement by modified gate and channel configurations., , , , , , , , , and 2 other author(s). ESSDERC, page 45-48. IEEE, (2013)Realization of 0.7-V analog circuits by adaptive-Vt operation of FinFET., , , , , , , , , and 1 other author(s). CICC, page 1-4. IEEE, (2010)Analysis of charge-to-hot-carrier degradation in Ge pFinFETs., , , , and . IRPS, page 1-4. IEEE, (2020)