%0 Conference Paper %1 conf/icip/CookL95 %A Cook, B. D. %A Lee, Soo-Young %B ICIP %D 1995 %I IEEE Computer Society %K dblp %P 442-445 %T Fast exposure simulation for large circuit patterns in electron beam lithography. %U http://dblp.uni-trier.de/db/conf/icip/icip1995-1.html#CookL95 %@ 0-8186-7310-9

@inproceedings{conf/icip/CookL95, added-at = {2023-03-24T00:00:00.000+0100}, author = {Cook, B. D. and Lee, Soo-Young}, biburl = {https://www.bibsonomy.org/bibtex/24d8209b22de1bc13b3bba11b0b866b84/dblp}, booktitle = {ICIP}, crossref = {conf/icip/1995}, ee = {https://doi.ieeecomputersociety.org/10.1109/ICIP.1995.529741}, interhash = {49fc7e2175c9465cc91da3ee8a5997b9}, intrahash = {4d8209b22de1bc13b3bba11b0b866b84}, isbn = {0-8186-7310-9}, keywords = {dblp}, pages = {442-445}, publisher = {IEEE Computer Society}, timestamp = {2024-04-09T09:40:57.000+0200}, title = {Fast exposure simulation for large circuit patterns in electron beam lithography.}, url = {http://dblp.uni-trier.de/db/conf/icip/icip1995-1.html#CookL95}, year = 1995 }