Abstract
The ultra thin body (UTB) SOI architecture offers a promising option
to extend MOSFET scaling. However, intrinsic parameter fluctuations
still remain one of the major challenges for the ultimate scaling
and integration of UTB-SOI MOSFETs. In this paper, using 3D statistical
numerical simulations, we investigate the impact of random discrete
dopants, body thickness variations and line edge roughness on the
magnitude of intrinsic parameter fluctuations in UTB-SOI MOSFETs.
The sources of intrinsic parameter fluctuations, which can be separated
in simulation, will occur simultaneously within a single MOSFET.
To understand the impact of these sources of fluctuation in an actual
device, simulations with all sources of intrinsic parameter fluctuations
acting in combination have also been performed.
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