%0 Journal Article %1 journals/mr/TomitaKYMUTFMI13 %A Tomita, Ryuji %A Kimura, Hidehiko %A Yasuda, M. %A Maeda, K. %A Ueno, S. %A Tonegawa, T. %A Fujimoto, T. %A Moritoki, M. %A Iwai, Hiroshi %D 2013 %J Microelectron. Reliab. %K dblp %N 5 %P 665-669 %T Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions. %U http://dblp.uni-trier.de/db/journals/mr/mr53.html#TomitaKYMUTFMI13 %V 53

@article{journals/mr/TomitaKYMUTFMI13, added-at = {2020-08-17T00:00:00.000+0200}, author = {Tomita, Ryuji and Kimura, Hidehiko and Yasuda, M. and Maeda, K. and Ueno, S. and Tonegawa, T. and Fujimoto, T. and Moritoki, M. and Iwai, Hiroshi}, biburl = {https://www.bibsonomy.org/bibtex/2d6ba75c5816455a404ffff3763b46ba6/dblp}, ee = {https://doi.org/10.1016/j.microrel.2012.12.011}, interhash = {97bd5da1dcbc5cb4125d443169c1feb8}, intrahash = {d6ba75c5816455a404ffff3763b46ba6}, journal = {Microelectron. Reliab.}, keywords = {dblp}, number = 5, pages = {665-669}, timestamp = {2020-08-18T11:45:08.000+0200}, title = {Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions.}, url = {http://dblp.uni-trier.de/db/journals/mr/mr53.html#TomitaKYMUTFMI13}, volume = 53, year = 2013 }