Author of the publication

Symmetrical ESD trigger and pull-up using BIMOS transistor in advanced CMOS technology.

, , , , , , , and . Microelectron. Reliab., 52 (9-10): 1998-2004 (2012)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

Fast Measurement of BTI on 28nm Fully Depleted Silicon-On-Insulator MOSFETs at Cryogenic Temperature down to 4K., , , , , , , , , and . IRPS, page 7. IEEE, (2022)On the need for a new ESD verification methodology to improve the reliability of ICs in advanced 28nm UTBB FD-SOI technology., , , , and . Microelectron. Reliab., (2016)Electro-thermal short pulsed simulation for SOI technology., , , , and . Microelectron. Reliab., 46 (9-11): 1482-1485 (2006)ESD protection using BIMOS transistor in 100 GHz RF application for advanced CMOS technology., , , , , , and . ICICDT, page 199-202. IEEE, (2013)A tunable and versatile 28nm FD-SOI crossbar output circuit for low power analog SNN inference with eNVM synapses., , , , , , , , , and . CoRR, (2023)A full characterization of single pitch IO ESD protection based on silicon controlled rectifier and dynamic trigger circuit in CMOS 32 nm node., , , , , and . Microelectron. Reliab., 51 (9-11): 1614-1617 (2011)Computation of Self-Induced Magnetic Field Effects Including the Lorentz Force for Fast-Transient Phenomena in Integrated-Circuit Devices., , and . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 33 (6): 893-902 (2014)6T SRAM performance and power gain using double gate MOS in 28nm FDSOI technology., , , , and . ICICDT, page 89-92. IEEE, (2013)Simulation, characterization and implementation of a new SCR-based device with a turn-off capability for EOS-immune ESD power supply clamps in advanced CMOS technology nodes., , , , , and . Microelectron. Reliab., (2018)Impact and damage on deep sub-micron CMOS technology induced by substrate current due to ESD stress., , , , , , , and . Microelectron. Reliab., 49 (9-11): 1107-1110 (2009)