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Personalizing Peloton: Combining Rankers and Filters To Balance Engagement and Business Goals.

, , , and . RecSys, page 575-576. ACM, (2021)

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Design-aware lithography., , and . ISPD, page 3-8. ACM, (2012)Timely Personalization at Peloton: A System and Algorithm for Boosting Time-Relevant Content., , , , , , and . RecSys, page 494-498. ACM, (2022)Electrically driven optical proximity correction based on linear programming., , , and . ICCAD, page 473-479. IEEE Computer Society, (2008)Design driven patterning optimizations for low K1 lithography., and . ICICDT, page 1-4. IEEE, (2012)ICCAD-2013 CAD contest in mask optimization and benchmark suite., , and . ICCAD, page 271-274. IEEE, (2013)A methodology for propagating design tolerances to shape tolerances for use in manufacturing., , , , and . DATE, page 1273-1278. IEEE Computer Society, (2010)Electrically-driven retargeting for nanoscale layouts., , and . CICC, page 1-4. IEEE, (2011)Fast lithographic mask optimization considering process variation., , , , and . ICCAD, page 230-237. IEEE, (2014)Fast Lithographic Mask Optimization Considering Process Variation., , , , and . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 35 (8): 1345-1357 (2016)SMATO: Simultaneous mask and target optimization for improving lithographic process window., , and . ICCAD, page 100-106. IEEE, (2010)