Author of the publication

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

Long Term NBTI Relaxation Under AC and DC Biased Stress and Recovery., , , and . IRPS, page 1-5. IEEE, (2019)Transformation of Ramped Current Stress VBDto Constant Voltage Stress TDDB TBD., , , and . IRPS, page 1-5. IEEE, (2019)A Flexible and Inherently Self-Consistent Methodology for MOL/BEOL/MIMCAP TDDB Applications with Excessive Variability-Induced Degradation., , , , , , , and . IRPS, page 2. IEEE, (2022)Dependence of Post-Breakdown Conduction on Gate Oxide Thickness., , and . Microelectron. Reliab., 42 (9-11): 1481-1484 (2002)Influence and model of gate oxide breakdown on CMOS inverters., , , , and . Microelectron. Reliab., 43 (9-11): 1439-1444 (2003)Analyzing path delays for accelerated testing of logic chips., , , , , , , and . IRPS, page 6. IEEE, (2015)Analysis of the effect of the gate oxide breakdown on SRAM stability., , , , , , , , , and . Microelectron. Reliab., 42 (9-11): 1445-1448 (2002)Electromigration characteristics of power grid like structures., , , , and . IRPS, page 4. IEEE, (2018)Improving and optimizing reliability in future technologies with high-κ dielectrics., , , and . VLSI-DAT, page 1-4. IEEE, (2013)A critical analysis of sampling-based reconstruction methodology for dielectric breakdown systems (BEOL/MOL/FEOL)., , , , , and . IRPS, page 2. IEEE, (2015)