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Effects of 1064 nm laser on MOS capacitor., , , , , , and . Microelectron. Reliab., 52 (9-10): 1816-1821 (2012)Characterization and Modeling of Gate-Induced-Drain-Leakage., , , , , , , and . IEICE Trans. Electron., 88-C (5): 829-837 (2005)Effects of Lightly Doped Drain and Channel Doping Variations on Flash Memory Performances and Reliability., , , , , , and . J. Low Power Electron., 8 (5): 717-724 (2012)A Schmitt trigger to benchmark the performance of a new zero-cost transistor., , , , , , , , and . ICECS 2022, page 1-4. IEEE, (2022)Dynamic current reduction of CMOS digital circuits through design and process optimization., , , , , , , , , and 1 other author(s). PATMOS, page 77-81. IEEE, (2015)Investigation of the effects of constant voltage stress on thin SiO2 layers using dynamic measurement protocols., , , , , , , and . Microelectron. Reliab., 52 (9-10): 1895-1900 (2012)MM11 based flash memory cell model including characterization procedure., , , , , , and . ISCAS, IEEE, (2006)Effect of AC stress on oxide TDDB and trapped charge in interface states., , , , and . ISIC, page 416-419. IEEE, (2014)A Tunneling Model for Gate Oxide Failure in Deep Sub-Micron Technology., , and . DATE, page 1404-1405. IEEE Computer Society, (2004)40nm SONOS Embedded Select in Trench Memory., , , , , , , , , and 3 other author(s). ESSDERC, page 21-24. IEEE, (2023)