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Etching characteristics of a silicon surface induced by focused ion beam irradiation.

, , , , , , , , и . Int. J. Manuf. Technol. Manag., 9 (1/2): 34-50 (2006)

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Takeshi Morita

Noboru Yamazaki

Takeshi Morita

Noboru Sonoyama

Noboru Hasegawa

 

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