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Fundamental understanding of NBTI degradation mechanism in IGZO channel devices., , , , , , , , , and 1 other author(s). IRPS, page 1-7. IEEE, (2024)Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion > 30 µA/µm., , , , , , , , , and 14 other author(s). VLSI Technology and Circuits, page 292-293. IEEE, (2022)Lowest IOFF < 3×10-21 A/μm in capacitorless DRAM achieved by Reactive Ion Etch of IGZO-TFT., , , , , , , , , and 1 other author(s). VLSI Technology and Circuits, page 1-2. IEEE, (2023)Device engineering guidelines for performance boost in IGZO front gated TFTs based on defect control., , , , , , , , , and 10 other author(s). ICICDT, page 88. IEEE, (2022)Light-Assisted Investigation of the Role of Oxygen Flow during IGZO Deposition on Deep Subgap States and their Evolution Under PBTI., , , , , , , , , and 1 other author(s). IRPS, page 1-6. IEEE, (2024)Degradation mechanism of amorphous IGZO-based bipolar metal-semiconductor-metal selectors., , , , , , , , , and 1 other author(s). IRPS, page 10-1. IEEE, (2022)