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6T SRAM performance and power gain using double gate MOS in 28nm FDSOI technology., , , , and . ICICDT, page 89-92. IEEE, (2013)Toward Gated-Diode-BIMOS for thin silicon ESD protection in advanced FD-SOI CMOS technologies., , , , and . ICICDT, page 1-4. IEEE, (2017)Optimized in situ heating control on a new MOS device structure in 28nm UTBB FD-SOI CMOS technology., , and . ICICDT, page 157-160. IEEE, (2018)Computation of Self-Induced Magnetic Field Effects Including the Lorentz Force for Fast-Transient Phenomena in Integrated-Circuit Devices., , and . IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 33 (6): 893-902 (2014)BIMOS transistor and its applications in ESD protection in advanced CMOS technology., , , , , , , , and . ICICDT, page 1-4. IEEE, (2012)Experimental and 3D simulation correlation of a gg-nMOS transistor under high current pulse., , , , , , and . Microelectron. Reliab., 42 (9-11): 1299-1302 (2002)Experimental measurements and 3D simulation of the parasitic lateral bipolar transistor triggering within a single finger gg-nMOS under ESD., , , , and . Microelectron. Reliab., 44 (9-11): 1775-1780 (2004)Preliminary results on TFET - Gated diode in thin silicon film for IO design & ESD protection in 28nm UTBB FD-SOI CMOS technology., and . ICICDT, page 1-4. IEEE, (2016)Circuit optimization of 4T, 6T, 8T, 10T SRAM bitcells in 28nm UTBB FD-SOI technology using back-gate bias control., , , , , and . ESSCIRC, page 415-418. IEEE, (2013)Temperature and Gate Leakage Influence on the Z2-FET Memory Operation., , , , , , and . ESSDERC, page 238-241. IEEE, (2019)