Author of the publication

Fast temperature cycling and electromigration induced thin film cracking in multilevel interconnection: experiments and modeling.

, , , , , , , and . Microelectron. Reliab., 42 (9-11): 1415-1420 (2002)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

The time-voltage trade-off for ESD damage threshold in amorphous silicon hydrogenated thin-film transistors., , , and . Microelectron. Reliab., 41 (9-10): 1391-1396 (2001)Role of package parasitics and substrate resistance on the Charged Device Model (CDM) failure levels -An explanation and die protection strategy., , , , and . Microelectron. Reliab., 43 (9-11): 1569-1575 (2003)Plasma Charging Damage Reduction in IC Processing by A Self-balancing Interconnect., , , , and . Microelectron. Reliab., 44 (9-11): 1503-1507 (2004)A 3-D Circuit Model to evaluate CDM performance of ICs., , , , , and . Microelectron. Reliab., 45 (9-11): 1425-1429 (2005)Zapping thin film transistors., , and . Microelectron. Reliab., 42 (4-5): 747-765 (2002)Applying the fWLR concept to Stress induced leakage current in non-volatile memory processes., , , , and . Microelectron. Reliab., 44 (8): 1269-1273 (2004)Simulation and experimental characterization of reservoir and via layout effects on electromigration lifetime., , , , and . Microelectron. Reliab., 42 (9-11): 1421-1425 (2002)The influence of technology variation on ggNMOSTs and SCRs against CDM BSD stress., , , , and . Microelectron. Reliab., 42 (9-11): 1287-1292 (2002)Automotive IC reliability: Elements of the battle towards zero defects.. Microelectron. Reliab., 48 (8-9): 1459-1463 (2008)Investigations on double-diffused MOS transistors under ESD zap conditions., , , and . Microelectron. Reliab., 41 (3): 395-405 (2001)