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Grid-based Self-Aligned Quadruple Patterning aware two dimensional routing pattern., , , and . DATE, page 241-244. IEEE, (2016)Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation., , , and . ASP-DAC, page 81-86. IEEE, (2017)Selected sequence-pair: an efficient decodable packing representation in linear time using sequence-pair., and . ASP-DAC, page 331-337. ACM, (2003)Manufacturability-aware mask assignment in multiple patterning lithography., , , , , and . APCCAS, page 538-541. IEEE, (2016)A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation., , and . DATE, page 49-54. IEEE, (2016)A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation., , , , , and . ISPD, page 161-168. ACM, (2016)A fast process variation and pattern fidelity aware mask optimization algorithm., , , and . ICCAD, page 238-245. IEEE, (2014)Thermal Driven Module Placement Using Sequence-pair., , , and . APCCAS, page 1871-1874. IEEE, (2006)A fast algorithm for rectilinear block packing based on selected sequence-pair., , and . Integr., 40 (3): 274-284 (2007)Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control., , , , , , , and . ASP-DAC, page 267-272. IEEE, (2013)