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In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction., , , , , , , , , and . Microelectron. Reliab., 41 (7): 995-998 (2001)SEMI-CenterNet: A Machine Learning Facilitated Approach for Semiconductor Defect Inspection., , , , , and . CoRR, (2023)Improving Accuracy and Transferability of Machine Learning Chemical Activation Energies by Adding Electronic Structure Information., , , and . J. Chem. Inf. Model., 63 (5): 1454-1461 (March 2023)Mechanism of O2-anneal induced Vfb shifts of Ru gated stacks., , , , , , , , , and 5 other author(s). Microelectron. Reliab., 47 (4-5): 518-520 (2007)Observation and characterization of defects in HfO2 high-K gate dielectric layers., , , , , , , , , and . Microelectron. Reliab., 45 (5-6): 798-801 (2005)Devices and Circuits Using Novel 2-D Materials: A Perspective for Future VLSI Systems., , , , , and . IEEE Trans. Very Large Scale Integr. Syst., 27 (7): 1486-1503 (2019)Modelling mobility degradation due to remote Coulomb scattering from dielectric charges and its impact on MOS device performance., , , , , , and . Microelectron. Reliab., 45 (5-6): 794-797 (2005)Energy distribution of positive charges in high-k dielectric., , , , , , , and . Microelectron. Reliab., 54 (9-10): 2329-2333 (2014)Nanoscale and device level electrical behavior of annealed ALD Hf-based gate oxide stacks grown with different precursors., , , , , , and . Microelectron. Reliab., 53 (6): 867-871 (2013)Code Generation Using Machine Learning: A Systematic Review., , , , and . IEEE Access, (2022)