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Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization.

M. Kuramochi, Y. Kohira, H. Tanabe, T. Matsunawa, and C. Kodama. IEEE Access, (2024)

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Tetsuaki Kurusu

Other publications of authors with the same name

Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning.Y. Lin, Y. Watanabe, T. Kimura, T. Matsunawa, S. Nojima, M. Li, and D. Pan. ISPD, page 82-89. ACM, (2018)Data Efficient Lithography Modeling with Transfer Learning and Active Data Selection.Y. Lin, M. Li, Y. Watanabe, T. Kimura, T. Matsunawa, S. Nojima, and D. Pan. CoRR, (2018)Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection.Y. Lin, M. Li, Y. Watanabe, T. Kimura, T. Matsunawa, S. Nojima, and D. Pan. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 38 (10): 1900-1913 (2019)Laplacian eigenmaps and bayesian clustering based layout pattern sampling and its applications to hotspot detection and OPC.T. Matsunawa, B. Yu, and D. Pan. ASP-DAC, page 679-684. IEEE, (2016)A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation.X. Xu, T. Matsunawa, S. Nojima, C. Kodama, T. Kotani, and D. Pan. ISPD, page 161-168. ACM, (2016)Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization.M. Kuramochi, Y. Kohira, H. Tanabe, T. Matsunawa, and C. Kodama. IEEE Access, (2024)Machine learning and pattern matching in physical design.B. Yu, D. Pan, T. Matsunawa, and X. Zeng. ASP-DAC, page 286-293. IEEE, (2015)Subresolution Assist Feature Generation With Supervised Data Learning.X. Xu, Y. Lin, M. Li, T. Matsunawa, S. Nojima, C. Kodama, T. Kotani, and D. Pan. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 37 (6): 1225-1236 (2018)Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation.Y. Tomioka, T. Matsunawa, C. Kodama, and S. Nojima. ASP-DAC, page 81-86. IEEE, (2017)Adaptive Optical Proximity Correction Using an Optimization Method.T. Matsunawa, H. Nosato, H. Sakanashi, M. Murakawa, E. Takahashi, T. Terasawa, T. Tanaka, O. Suga, and T. Higuchi. CIT, page 853-860. IEEE Computer Society, (2007)

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Disambiguation of "Matsunawa, Tetsuaki"

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Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization.

Please choose a person to relate this publication to

Tetsuaki Kurusu

Other publications of authors with the same name

Disambiguation

BibSonomy

Disambiguation of "Matsunawa, Tetsuaki"

copydeleteadd this publication to your clipboardcommunity posthistory of this postURLDOIBibTeXEndNoteAPAChicagoDIN 1505HarvardMSOffice XML Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization.

Please choose a person to relate this publication to

Tetsuaki Kurusu

Other publications of authors with the same name

Disambiguation

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URL
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Chicago
DIN 1505
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Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization.