Author of the publication

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

Investigation of the endurance of FE-HfO2 devices by means of TDDB studies., , , , , , , , , and . IRPS, page 6. IEEE, (2018)New Insights into the Imprint Effect in FE-HfO2 and its Recovery., , , , , , , , , and 3 other author(s). IRPS, page 1-7. IEEE, (2019)Conductive filaments multiplicity as a variability factor in CBRAM., , , , , , and . IRPS, page 11. IEEE, (2015)How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning., , , , , , , and . Computer, 57 (1): 51-58 (January 2024)Enhancement of CBRAM performance by controlled formation of a hourglass-shaped filament., , , , , , and . NVMTS, page 1-5. IEEE, (2017)Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion > 30 µA/µm., , , , , , , , , and 14 other author(s). VLSI Technology and Circuits, page 292-293. IEEE, (2022)A comprehensive variability study of doped HfO2 FeFET for memory applications., , , , , , , , and . IMW, page 1-4. IEEE, (2022)