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A polynomial time exact algorithm for self-aligned double patterning layout decomposition.

, , , и . ISPD, стр. 17-24. ACM, (2012)

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Fei Du

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Другие публикации лиц с тем же именем

Optimization for advanced lithography. University of Illinois Urbana-Champaign, USA, (2014)A polynomial time exact algorithm for self-aligned double patterning layout decomposition., , , и . ISPD, стр. 17-24. ACM, (2012)Directed Self-Assembly (DSA) Template Pattern Verification., , , , , , и . DAC, стр. 55:1-55:6. ACM, (2014)A Novel Method of Human Tracking Based on Stereo Vision., и . CCIS, стр. 883-889. IEEE, (2018)Optimally minimizing overlay violation in self-aligned double patterning decomposition for row-based standard cell layout in polynomial time., , , и . ICCAD, стр. 32-39. IEEE, (2013)Polynomial time optimal algorithm for stencil row planning in e-beam lithography., , и . ASP-DAC, стр. 658-664. IEEE, (2015)Contact pitch and location prediction for Directed Self-Assembly template verification., , , , , и . ASP-DAC, стр. 644-651. IEEE, (2015)Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography., , , , , , и . DAC, стр. 93:1-93:6. ACM, (2013)Self-aligned double patterning decomposition for overlay minimization and hot spot detection., , , и . DAC, стр. 71-76. ACM, (2011)Mask cost reduction with circuit performance consideration for self-aligned double patterning., , , и . ASP-DAC, стр. 787-792. IEEE, (2011)