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Optical lithography extension with double patterning.

S. Nojima. ISPD, page 68. ACM, (2013)

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Shigeki Nagai

Shigeki Tomo

Kunio Nojima

Yutaka Nojima

Other publications of authors with the same name

Data Efficient Lithography Modeling With Transfer Learning and Active Data Selection.Y. Lin, M. Li, Y. Watanabe, T. Kimura, T. Matsunawa, S. Nojima, and D. Pan. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 38 (10): 1900-1913 (2019)Manufacturability-aware mask assignment in multiple patterning lithography.Y. Kohira, A. Takahashi, T. Matsui, C. Kodama, S. Nojima, and S. Tanaka. APCCAS, page 538-541. IEEE, (2016)A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation.X. Xu, T. Matsunawa, S. Nojima, C. Kodama, T. Kotani, and D. Pan. ISPD, page 161-168. ACM, (2016)Data Efficient Lithography Modeling with Residual Neural Networks and Transfer Learning.Y. Lin, Y. Watanabe, T. Kimura, T. Matsunawa, S. Nojima, M. Li, and D. Pan. ISPD, page 82-89. ACM, (2018)Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control.C. Kodama, H. Ichikawa, K. Nakayama, T. Kotani, S. Nojima, S. Mimotogi, S. Miyamoto, and A. Takahashi. ASP-DAC, page 267-272. IEEE, (2013)Fast mask assignment using positive semidefinite relaxation in LELECUT triple patterning lithography.Y. Kohira, T. Matsui, Y. Yokoyama, C. Kodama, A. Takahashi, S. Nojima, and S. Tanaka. ASP-DAC, page 665-670. IEEE, (2015)TEMPO: Fast Mask Topography Effect Modeling with Deep Learning.W. Ye, M. Alawieh, Y. Watanabe, S. Nojima, Y. Lin, and D. Pan. ISPD, page 127-134. ACM, (2020)Data Efficient Lithography Modeling with Transfer Learning and Active Data Selection.Y. Lin, M. Li, Y. Watanabe, T. Kimura, T. Matsunawa, S. Nojima, and D. Pan. CoRR, (2018)Subresolution Assist Feature Generation With Supervised Data Learning.X. Xu, Y. Lin, M. Li, T. Matsunawa, S. Nojima, C. Kodama, T. Kotani, and D. Pan. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 37 (6): 1225-1236 (2018)Optical lithography extension with double patterning.S. Nojima. ISPD, page 68. ACM, (2013)

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Disambiguation of "Nojima, Shigeki"

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Optical lithography extension with double patterning.

Please choose a person to relate this publication to

Shigeki Nagai

Shigeki Tomo

Kunio Nojima

Yutaka Nojima

Other publications of authors with the same name

Disambiguation

BibSonomy

Disambiguation of "Nojima, Shigeki"

copydeleteadd this publication to your clipboardcommunity posthistory of this postURLDOIBibTeXEndNoteAPAChicagoDIN 1505HarvardMSOffice XML Optical lithography extension with double patterning.

Please choose a person to relate this publication to

Shigeki Nagai

Shigeki Tomo

Kunio Nojima

Yutaka Nojima

Other publications of authors with the same name

Disambiguation

copy delete add this publication to your clipboard
community post
history of this post
URL
DOI
BibTeX
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APA
Chicago
DIN 1505
Harvard
MSOffice XML

Optical lithography extension with double patterning.