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Tunneling transistors based on MoS2/MoTe2 Van der Waals heterostructures., , , , , , , , , и 1 other автор(ы). ESSDERC, стр. 106-109. IEEE, (2017)Analysis of BTI in 300 mm integrated dual-gate WS2 FETs., , , , , , и . DRC, стр. 1-2. IEEE, (2022)Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs., , , , , , , , , и 2 other автор(ы). IRPS, стр. 1-6. IEEE, (2023)Beyond-Si materials and devices for more Moore and more than Moore applications., , , , , , , , , и 16 other автор(ы). ICICDT, стр. 1-5. IEEE, (2016)Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach., , , , , , , , , и 7 other автор(ы). VLSI Technology and Circuits, стр. 1-2. IEEE, (2023)Tunnel FETs using Phosphorene/ReS2 heterostructures., , , , , и . DRC, стр. 113-114. IEEE, (2019)WS2 transistors on 300 mm wafers with BEOL compatibility., , , , , , , , , и 8 other автор(ы). ESSDERC, стр. 212-215. IEEE, (2017)The Promise of 2-D Materials for Scaled Digital and Analog Applications., , , , , , , , , и 2 other автор(ы). ISSCC, стр. 394-395. IEEE, (2023)Experimental calibration of the temperature dependence of the heterojunction bandgap in III-V tunneling devices., , , , и . DRC, стр. 253-254. IEEE, (2019)Integration of epitaxial monolayer MX₂ channels on 300mm wafers via Collective-Die-To-Wafer (CoD2W) transfer., , , , , , , , , и 10 other автор(ы). VLSI Technology and Circuits, стр. 1-2. IEEE, (2023)