Author of the publication

Design Choice in 45-nm Dual-Port SRAM - 8T, 10T Single End, and 10T Differential.

, , , , , , and . IPSJ Trans. Syst. LSI Des. Methodol., (2011)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

A cost-effective 45nm 6T-SRAM reducing 50mV Vmin and 53% standby leakage with multi-Vt asymmetric halo MOS and write assist circuitry., , , , , , and . ISQED, page 438-441. IEEE, (2013)A 12nm 121-TOPS/W 41.6-TOPS/mm2 All Digital Full Precision SRAM-based Compute-in-Memory with Configurable Bit-width For AI Edge Applications., , , , , , , , and . VLSI Technology and Circuits, page 24-25. IEEE, (2022)3.7-GHz Multi-Bank High-Current Single-Port Cache SRAM with 0.5V-1.4V Wide Voltage Range Operation in 3nm FinFET for HPC Applications., , , , , , , , and . VLSI Technology and Circuits, page 1-2. IEEE, (2023)34.4 A 3nm, 32.5TOPS/W, 55.0TOPS/mm2 and 3.78Mb/mm2 Fully-Digital Compute-in-Memory Macro Supporting INT12 × INT12 with a Parallel-MAC Architecture and Foundry 6T-SRAM Bit Cell., , , , , , , , , and 13 other author(s). ISSCC, page 572-574. IEEE, (2024)A 10T Non-Precharge Two-Port SRAM for 74% Power Reduction in Video Processing., , , , , , and . ISVLSI, page 107-112. IEEE Computer Society, (2007)A 28-nm 1R1W Two-Port 8T SRAM Macro With Screening Circuitry Against Read Disturbance and Wordline Coupling Noise Failures., , , , , and . IEEE Trans. Very Large Scale Integr. Syst., 26 (11): 2335-2344 (2018)A stable chip-ID generating physical uncloneable function using random address errors in SRAM., , , , , , and . SoCC, page 143-147. IEEE, (2012)12.1 A 7nm 256Mb SRAM in high-k metal-gate FinFET technology with write-assist circuitry for low-VMIN applications., , , , , , , , , and 6 other author(s). ISSCC, page 206-207. IEEE, (2017)A 5-nm 135-Mb SRAM in EUV and High-Mobility Channel FinFET Technology With Metal Coupling and Charge-Sharing Write-Assist Circuitry Schemes for High-Density and Low-VMIN Applications., , , , , , , , , and 2 other author(s). IEEE J. Solid State Circuits, 56 (1): 179-187 (2021)A dynamic body-biased SRAM with asymmetric halo implant MOSFETs., , , , , , and . ISLPED, page 285-290. IEEE/ACM, (2011)