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Time evolution of SiO2/Si interface defects and dopant passivation in MOS capacitors

, , and . MICROELECTRONIC ENGINEERING, (2000)3rd International Conference on Low Dimensional Structures and Devices (LDSD 99), ANTALYA, TURKEY, SEP 15-17, 1999.
DOI: 10.1016/S0167-9317(99)00520-1

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