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Holisitic device exploration for 7nm node., , , , , , , , , and 5 other author(s). CICC, page 1-5. IEEE, (2015)Dimensioning for power and performance under 10nm: The limits of FinFETs scaling., , , , , , , and . ICICDT, page 1-4. IEEE, (2015)Circuit and process co-design with vertical gate-all-around nanowire FET technology to extend CMOS scaling for 5nm and beyond technologies., , , , , , , , , and 6 other author(s). ESSDERC, page 102-105. IEEE, (2014)Lateral NWFET optimization for beyond 7nm nodes., , , , , , , , , and 3 other author(s). ICICDT, page 1-4. IEEE, (2015)Device/system performance modeling of stacked lateral NWFET logic., , , , and . ISQED, page 215-220. IEEE, (2016)Device circuit and technology co-optimisation for FinFET based 6T SRAM cells beyond N7., , , , , , , , , and 2 other author(s). ESSDERC, page 256-259. IEEE, (2017)Design technology co-optimization for enabling 5nm gate-all-around nanowire 6T SRAM., , , , , , , and . ICICDT, page 1-4. IEEE, (2015)STI and eSiGe source/drain epitaxy induced stress modeling in 28 nm technology with replacement gate (RMG) process., , , , , , , , and . ESSDERC, page 159-162. IEEE, (2013)