Author of the publication

Degradation of static and dynamic behavior of CMOS inverters during constant and pulsed voltage stress.

, , , , and . Microelectron. Reliab., 46 (9-11): 1669-1672 (2006)

Please choose a person to relate this publication to

To differ between persons with the same name, the academic degree and the title of an important publication will be displayed. You can also use the button next to the name to display some publications already assigned to the person.

 

Other publications of authors with the same name

Impact of the As dose in 0.35 mum EEPROM technology: characterization and modeling., , , and . Microelectron. Reliab., 41 (7): 999-1002 (2001)Impact of interface and bulk trapped charges on transistor reliability., , , , , , , and . Microelectron. Reliab., 45 (5-6): 857-860 (2005)Charge-related phenomena and reliability of non-volatile memories.. Microelectron. Reliab., 52 (9-10): 1876-1882 (2012)Trapped charge and stress induced leakage current (SILC) in tunnel SiO2 layers of de-processed MOS non-volatile memory devices observed at the nanoscale., , , , , and . Microelectron. Reliab., 49 (9-11): 1188-1191 (2009)Impact of gate stack process on conduction and reliability of 0.18 mum PMOSFET., , , , , , , , and . Microelectron. Reliab., 43 (8): 1221-1227 (2003)Evaluation methodology of thin dielectrics for non-volatile memory application., and . Microelectron. Reliab., 42 (9-11): 1473-1480 (2002)Tunnel oxide degradation under pulsed stress., , , , , and . Microelectron. Reliab., 45 (9-11): 1337-1342 (2005)High-K dielectrics for inter-poly application in non volatile memories., , , and . Microelectron. Reliab., 47 (4-5): 598-601 (2007)Lifetime estimation of analog circuits from the electrical characteristics of stressed MOSFETs., , , , , , , and . Microelectron. Reliab., 47 (9-11): 1349-1352 (2007)In situ steam generation (ISSG) versus standard steam technology: impact on oxide reliability., , , and . Microelectron. Reliab., 45 (5-6): 875-878 (2005)